February 15, 2026
Photoresist Chemicals

Urea, N-[4,5-dihydro-5-[[4-(phenylmethyl)-1-piperidinyl]methyl]-2-oxazolyl]-N’- phenyl-

 

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Phenol, 4-[2-[5-(2-aminoethyl)tetrahydro-2-furanyl]ethyl]-

Decanoic acid, 2-oxo-3-(2-propenyl)-

Acetamide, N-[(1S,2S)-1-[(3,5-difluorophenyl)methyl]-2-hydroxy-2-[(3R,6R)-6-[(tetra hydro-4-methyl-2H-pyran-4-yl)methoxy]-3-morpholinyl]ethyl]-, monohydrochloride

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