February 11, 2026
Photoresist Chemicals

Propanedioic acid, [2-[(tributylstannyl)methyl]-2-propenyl]-, dimethyl ester

  • 658686-69-2
  • C21H40O4Sn

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2-Furancarboxylic acid, 5-[[5-(hydroxymethyl)-1H-imidazol-1-yl]methyl]-, ethyl ester

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1H-Indene, 5-bromo-2,3-dihydro-4-[3-(1-methylethyl)-4-(phenylmethoxy)phenoxy]-7- nitro-

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