June 28, 2025
Photoresist Chemicals

Phenol, 4,4′-(bicyclo[2.2.1]hept-2-ylphosphinylidene)bis-

  • 924366-55-2
  • C19H21O3P

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Cyclobutanecarboxylic acid, 1-[[1,4-dioxo-4-(phenylmethoxy)-2-[[(phenylmethoxy)carbonyl]amino]but yl]amino]-, methyl ester, (S)-

61417-19-4

Benzene, 1,3,5-trimethyl-2,4,6-tris[(2,4,6-tribromophenoxy)methyl]-

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