February 15, 2026
Photoresist Chemicals

Oxiranecarboxylic acid, 2-butyl-3-(tetrahydro-2,2-dimethyl-2H-pyran-4-yl)-, ethyl ester

 

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Phosphonic acid, [[[5-[2-chloro-4-(trifluoromethyl)phenoxy]-2-nitrophenyl]amino]methyl]-, monoethyl ester

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