Photoresist Chemicals Acetic acid, trifluoro-, 1,6-hexanediyl ester Cas:816-51-3 Molecular Formula:C10H12F6O4
Photoresist Chemicals Carbamic acid, [2-(2,5-dioxo-4-imidazolidinyl)ethoxy]-, ethyl ester Cas:92117-88-9 Molecular Formula:C8H13N3O5