February 15, 2026
Photoresist Chemicals

Cyclohexanecarboxamide, N-[2-(1-pyrrolidinyl)ethyl]-4-[[4-[(2,5,7-trimethyl-3H-imidazo[4,5-b]pyridin -3-yl)methyl]phenyl]amino]-, trans-

 

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Acetic acid, [4-[[5-(aminothioxomethyl)-1,3-dihydro-1-oxo-2H-isoindol-2-yl]acetyl]-3- ethoxyphenoxy]-, ethyl ester

Benzonitrile,2-[(tetrahydro-2H-pyran-4-yl)oxy]-

Carbamic acid, [(3S,4R)-4-phenyl-3-piperidinyl]-, 1,1-dimethylethyl ester

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