June 25, 2025
Photoresist Chemicals

Cycloheptanecarboxylic acid, 1-[(formylhydroxyamino)methyl]-, 2-(7-methyl-1,2,4-benzotriazin-3-yl)hydrazide

 

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2-Butenoic acid, 3-[[(4-chlorophenyl)methyl]amino]-2-cyano-, 2-ethoxyethyl ester

3-Mercapto-2-butanol (mixture of isomers)

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