Photoresist Chemicals Carbamic acid, cyclopropyl[(tetrahydro-2H-pyran-4-yl)methyl]-, [(3S,4S)-4-[[[4-ethyl-3-(3-methoxypropoxy)benzoyl](1-methylethyl)amino ]methyl]-3-pyrrolidinyl]methyl ester Cas:911121-44-3 Molecular Formula:C32H51N3O6