February 14, 2026
Photoresist Chemicals

Carbamic acid, cyclohexyl(2,2,6,6-tetramethyl-4-piperidinyl)-, 1,6-hexanediyl ester

 

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3,5-Pyridinedicarboxylic acid, 4-(2,3-dichlorophenyl)-1,4-dihydro-2,6-dimethyl-, methyl 7-[(5-phenyl-1H-pyrazol-3-yl)oxy]heptyl ester

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2H-Pyrrol-2-one, 3,4-diethyl-1,5-dihydro-5-(2-pyridinylmethylene)-

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