Photoresist Chemicals Carbamic acid, [2-[[(1,1-dimethylethyl)diphenylsilyl]oxy]ethyl](1-methylethyl)-, (2R,3R,6S)-tetrahydro-4-methylene-2,6-dipropyl-2H-pyran-3-yl ester, rel- Cas:488808-59-9 Molecular Formula:C34H51NO4Si