August 26, 2025
Photoresist Chemicals

Butanoic acid, 3-methyl-, [[[(carboxymethyl)(1,1-dimethylethyl)amino]carbonyl]oxy]methyl ester

 

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Benzoic acid, 4-chloro-2-[[4-(4-morpholinylmethyl)-2-nitrophenyl]amino]-, methyl ester

Diselenic acid, diethyl ester

1H-Indene-2-carbothioamide, N-(4-bromophenyl)-3-(4-morpholinyl)-

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