February 12, 2026
Photoresist Chemicals

Butanedioic acid, monomethyl ester, ion(1-)

  • 93278-49-0
  • C5H7O4

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Benzoic acid, 5-[2-[5-chloro-2-[(2,5-difluorophenyl)methoxy]-3-pyridinyl]-1-cyclopenten -1-yl]-2-fluoro-, ethyl ester

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