June 26, 2025
Photoresist Chemicals

Bicyclo[3.3.1]nonane-3-carboxylic acid, 7-(1,1-dimethylethyl)-, methyl ester, (3-endo,7-exo)-

 

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Peroxide, bis(3-chloro-2,2,3,3-tetrafluoro-1-oxopropyl)

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Carbamic acid, [(1R)-1-[(4-chlorophenyl)methyl]-2-[4-cyclohexyl-4-[[(4S)-2-oxo-4-propyl- 3-oxazolidinyl]methyl]-1-piperidinyl]-2-oxoethyl]-, 1,1-dimethylethyl ester

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