Photoresist Chemicals Bicyclo[3.1.0]hexane-2,6-dicarboxylic acid, 2-amino-3-[(3,4-dichlorophenyl)methoxy]-, diethyl ester, (1S,2R,3R,5R,6S)- Cas：820260-56-8 Molecular Formula：C19H23Cl2NO5