Photoresist Chemicals Bicyclo[3.1.0]hexane-2,6-dicarboxylic acid, 2-amino-3-[(3,4-dichlorophenyl)methoxy]-, 6-ethyl 2-(phenylmethyl) ester, (1S,2R,3R,5R,6S)- Cas：820260-55-7 Molecular Formula：C24H25Cl2NO5