June 26, 2025
Photoresist Chemicals

Benzoic acid, 4-(tetradecyloxy)-, 4-[[(4-ethylphenyl)imino]methyl]-2-methoxyphenyl ester

 

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1-Piperazinecarboxamide, N-isoxazolo[5,4-b]pyridin-3-yl-4-(3-phenyl-1,2,4-thiadiazol-5-yl)-

4-Heptanone, 3-[(tetrahydro-2H-pyran-2-yl)oxy]-

TIANFU CHEM– 6-hydroxy-5-methylnicotinaldehyde

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