August 25, 2025
Photoresist Chemicals

Benzenesulfonic acid, 4-methyl-, (bicyclo[3.2.1]oct-6-en-3-ylmethylene)hydrazide, exo-

 

  • 61597-67-9
  • C16H20N2O2S

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1-Butanamine,phosphonomethylated, partially reduced, potassiumsalts

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