June 28, 2025
Photoresist Chemicals

Benzenesulfonamide, N-[4-hydroxy-3-methyl-5-(1-piperidinylsulfonyl)phenyl]-4-methyl-2,6-bis( 1-methylethyl)-

 

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Pyrrolo[1,2-a]pyrazine-6-carboxylic acid, 3-butyloctahydro-2-[(4-methylphenyl)methyl]-1,4-dioxo-

6-Heptenoic acid, 2,2-dibromo-3-oxo-, methyl ester

5-Pyrimidinecarboxylic acid, 2,4-bis(2,4-difluorophenoxy)-

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