February 15, 2026
Photoresist Chemicals

Benzenepropanamide, 2-ethyl-a-[[4-fluoro-2-(trifluoromethyl)benzoyl]amino]-N-methyl-

 

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TIANFUCHEM-L-Phenylalanine, L-arginylglycyl-L-threonyl-L-phenylalanyl-L-glutaminylglycyl-L-lysyl-

2H-Pyran-2,5-diol, tetrahydro-, 5-(4-nitrobenzoate)

2-Furancarboxylicacid,5-(1,1-dimethylethyl)-3-methyl-,2-(cyclohexylamino)-2-oxo-1-phenylethylester(9CI)

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