February 12, 2026
Photoresist Chemicals

Benzenemethanol, a-pentyl-4-(trifluoromethyl)-

  • 851136-87-3
  • C13H17F3O

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Propanoic acid,2-hydroxy-, 1-methyl-2-oxo-2-(2-propen-1-yloxy)ethyl ester,cas:6283-80-3

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