June 25, 2025
Photoresist Chemicals

Azepino[4,5-b]indole-5-carboxylic acid, 3-(4-fluorobenzoyl)-1,2,3,6-tetrahydro-7-hydroxy-, ethyl ester

 

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[1,2,4]Triazolo[1,5-a]quinoxaline-2-carboxylic acid, 4,5-dihydro-4-oxo-8-(4H-1,2,4-triazol-4-yl)-7-(trifluoromethyl)-

Phenol, 4-((4-amino-3-methylphenyl)amino)-, reaction products withsodium sulfide (Na2(Sx)), reduced

1H-Pyrazole-4-carboxamide, 3-phenyl-N-[2-[3-(1-piperazinylmethyl)imidazo[2,1-b]thiazol-6-yl]phenyl]-

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