Photoresist Chemicals Adipic acid, neopentyl glycol, trimethylolpropane, trimethylolethane, isophthalic acid polymer modified with isononanoic acid Cas:68439-34-9 Molecular Formula:Adipic acid, neopentyl glycol, trimethylolpropane, trimethylolethane, isophthalic acid polymer modified with isononanoic acid