February 15, 2026
Photoresist Chemicals

Acetic acid, [(2,2-dimethyl-1-oxopropyl)amino][(5S)-5-methoxy-2-piperidinylidene]-, ethyl ester, (2E)-

 

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Methanone, [4-(3,4-difluorophenyl)-8-(trifluoromethyl)-3-quinolinyl]phenyl-

Benzamide, N-chloro-N-(3-phenylpropoxy)-

Cyclohexanol, 4-[[3-[(1E)-2-phenylethenyl]imidazo[1,2-b]pyridazin-6-yl]amino]-, trans-

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