February 12, 2026
Photoresist Chemicals

Acetic acid, trifluoro-, 1,6-hexanediyl ester

  • 816-51-3
  • C10H12F6O4

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2-Quinolinecarboxylic acid, 8-chloro-1,4-dihydro-4-[[(4-methylphenyl)sulfonyl]imino]-3-phenyl-, ethyl ester

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