June 25, 2025
Photoresist Chemicals

D-Aspartic acid, 3-methyl-N-[(4-methylphenyl)sulfonyl]-3-(1-oxopropyl)-, 4-(diphenylmethyl) 1-ethyl ester, (3R)-

 

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Carbamic acid, [trans-4-[[4-methyl-6-[methyl(2-phenyl-4-pyrimidinyl)amino]-2-pyrimidinyl ]amino]cyclohexyl]-, 1,1-dimethylethyl ester

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