Photoresist Chemicals 2-Butenoic acid, 4-[[4-(diethylamino)phenyl]amino]-4-oxo-, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl ester, (E)- Cas：91627-95-1 Molecular Formula：C24H21F17N2O3