June 26, 2025
Photoresist Chemicals

L-Aspartic acid, N-[(S)-(4-methylphenyl)sulfinyl]-2-(trifluoromethyl)-, 4-(1,1-dimethylethyl) 1-ethyl ester

 

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Oxiranecarboxylic acid, 2-butyl-3-(tetrahydro-2,2-dimethyl-2H-pyran-4-yl)-, ethyl ester

Uridine, 2′-deoxy-5-[3-[(trifluoroacetyl)amino]-1-propenyl]-

Carbamic acid, [5-fluoro-1,2-dihydro-1-[(2R,5S)-2-(hydroxymethyl)-1,3-oxathiolan-5-yl]- 2-oxo-4-pyrimidinyl]-, pentyl ester

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