June 29, 2025
Photoresist Chemicals

Pyrrolo[1,2-b]isoxazole-2,2,6(3H)-tricarboxylic acid, tetrahydro-, 2,2-diethyl 6-methyl ester

 

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Benzoic acid, 4-fluoro-, (3R,4S)-4-butoxy-3,4-dihydro-2,2-dimethyl-6-[[[4-(trifluoromethyl)phenyl] methyl]amino]-2H-1-benzopyran-3-yl ester, rel-

4-Pyridinecarboxylicacid, 3-chloro-, methyl ester

Thallium, (N-methyl-2-benzothiazolecarbothioamidato)-

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