February 15, 2026
Photoresist Chemicals

2-Hexenoic acid, 6-chloro-3-[[[(1,1-dimethylethoxy)carbonyl]methylamino]methyl]-, methyl ester, (2E)-

 

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Benzenecarboximidic acid, N-[5-bromo-4-(trifluoromethyl)-2-thiazolyl]-3-(trifluoromethyl)-, 2-(1,1-dimethylethyl)hydrazide

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