February 15, 2026
Photoresist Chemicals

5-Pyrimidinecarboxylic acid, 2-(methylthio)-4-[(phenylmethyl)thio]-6-[(3-pyridinylmethyl)amino]-

 

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4-tert-Butylbenzoic acid

1,3,5-Triazine-2,4(1H,3H)-dione, 6-[2-(dimethylamino)ethenyl]-1,3-dioctadecyl-

(11aS)-(-)-10,11,12,13-Tetrahydrodiindeno[7,1-de:1′,7′-fg][1,3,2]dioxaphosphocin-5-phenoxy, min. 98% (S)-ShiP

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