February 14, 2026
Photoresist Chemicals

4-Pyridinecarboxylic acid, 2-[hydroxybis(3-methylphenyl)acetyl]-1-phenylhydrazide

 

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2-Thiophenecarboxylic acid, 5-[3-[(4R)-4-[[[(1,1-dimethylethyl)dimethylsilyl]oxy]methyl]dihydro-2-oxo- 2H-1,3-oxazin-3(4H)-yl]propyl]-, 1-methylethyl ester

1,3-Dioxolane-4-butanol, 2,2-diphenyl-

93992-66-6

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