February 12, 2026
Photoresist Chemicals

4-Pyridinecarboxylic acid, 2-[2-[5-chloro-2-[(4-methoxyphenyl)methoxy]phenyl]-5-methyl-1H-pyrrol- 1-yl]-, ethyl ester

 

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TIANFUCHEM-2H-Pyrido[3,2-b]-1,4-thiazin-3(4H)-one, 6-[[[(2S,4R)-1-[(2R)-2-hydroxy-2-(6-methoxy-1,5-naphthyridin-4-yl)ethyl]- 2-(trifluoromethyl)-4-piperidinyl]amino]methyl]-

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