February 15, 2026
Photoresist Chemicals

2H-Pyrido[1,2-a]pyrazine-4-carbonitrile, 2-[(3-chlorophenyl)methyl]-1,8-dihydro-9-hydroxy-1,8-dioxo-

 

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Cyclobutanone, 4-chloro-2,2-dimethyl-3-(2-methyl-1-propenyl)-, cis-

1H-Indole-7-carboxamide, 3-[1-[[2-(1-methylethoxy)ethyl]sulfonyl]-4-piperidinyl]-5-phenyl-

2-Thiophenecarboxamide, N-[[2-(1-naphthalenyl)ethyl]sulfonyl]-5-(2,2,2-trifluoroacetyl)-

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