February 12, 2026
Photoresist Chemicals

2,6-Heptadienoic acid, 3-[[(1R)-1-phenylethyl]amino]-4-[(trimethylsilyl)oxy]-, ethyl ester, (4S)-

 

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Benzeneacetic acid, 4-(4-aminophenoxy)-a-[4-(1,1-dimethylethyl)phenoxy]-, methyl ester

[1,1′-Biphenyl]-4-sulfonamide, 3′-[2-(1-methylethyl)-5-(6-methyl-2-pyridinyl)-1H-imidazol-4-yl]-

5′-Adenylic acid, N-[2-(2-aminoethoxy)ethyl]-

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