June 27, 2025
Photoresist Chemicals

1H-Azepine-1-carboxylic acid, 3-[(1,3-dihydro-1,3-dioxo-2H-isoindol-2-yl)methyl]hexahydro-, 1,1-dimethylethyl ester

 

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TIANFU-CHEM Benzoic acid, 3,5-bis[[3,5-bis[[3,5-bis[3-(dodecyloxy)-2,2-bis[(dodecyloxy)methyl]prop oxy]phenyl]methoxy]phenyl]methoxy]-, methyl ester

1,2,4,5-Cyclohexanetetrol, 1-[[[2-(dimethylamino)ethyl]methylamino]methyl]-2-methyl-, tetraacetate (ester)

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