February 15, 2026
Photoresist Chemicals

1,6-Methanonaphthalene-1(2H)-carboxylic acid, octahydro-, cyano(3-phenoxyphenyl)methyl ester

 

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1H-Pyrazole-4-carboxylic acid, 3-[[(5-chloro-2-pyridinyl)carbonyl]amino]-1-methyl-, ethyl ester

Propanamide, N-(1-cyanocyclopropyl)-3-[[[6-(trifluoromethyl)-2-pyridinyl]methyl]sulfonyl] -2-[[(1S)-2,2,2-trifluoro-1-phenylethyl]amino]-, (2R)-

3,4-Pentadienoyl chloride, 2,2-dimethyl-

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