June 25, 2025
Photoresist Chemicals

1-Pyrrolidinecarboxylic acid, 2-(hydroxymethyl)-4-[[(4-methylphenyl)sulfonyl]oxy]-, phenylmethyl ester, (2S,4R)-

 

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3-Pyridinecarboxylic acid, 2-(4-chlorophenyl)-1,2,3,4-tetrahydro-6-methyl-4-oxo-, methyl ester, (2R,3S)-rel-

1-Pyrrolidinebutanamide, N-[5-(2-chlorophenyl)-1,3,4-oxadiazol-2-yl]-, monohydrochloride

Bis(?dimethylamino)tetrakis (dimethylamino)digallium, 98%

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